Specification:
Ion optics Sysytem:
Resolution of Ion image: 7nm@30kV
ion beam current density: 1PA-30nA
ion accelerate Voltage : 5-30kV
Magnification: 300-500k
Electron Optics System:
Resolution: 1.1nm@15kV
Beam current density: 1PA-30nA
Accelerate voltage: 0.2-30kV
Magnification: 35-900k
Application:
Micromachining, electron and ion imaging.
Pt and SiO2 deposition, enhance etching of metal and insulator.
Measuring element distribution.
picking up or moving the nano-scale specimens using the nano-manipulator.
Measuring the electricity of the device ,measuring the force with the micro-force tip(1µN-3mN ).
|